Semiconductor device manufacturing: process – Including control responsive to sensed condition – Interconnecting plural devices on semiconductor substrate
Reexamination Certificate
2005-03-29
2005-03-29
Niebling, John F. (Department: 2312)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Interconnecting plural devices on semiconductor substrate
Reexamination Certificate
active
06872581
ABSTRACT:
Methods for integrated circuit diagnosis, characterization or modification using a charged particle beam. In one implementation, the bulk silicon substrate of an integrated circuit is thinned to about 1 to 3 μm from the deepest well, a voltage is applied to a circuit element that is beneath the outer surface of the thinned substrate. The applied voltage induces an electrical potential on the outer surface, which is detected as a surface feature on the outer surface by its interaction with the charged particle beam.
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Lundquist Theodore R.
Shaw Christopher
Tsao Chun-Cheng
Fish & Richardson P.C.
Niebling John F.
NPTest Inc.
Stevenson André C
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