Measuring apparatus and exposure apparatus having the same

Details Measuring apparatus and exposure apparatus having the same Measuring apparatus and exposure apparatus having the same

2007-11-13

2007-11-13

Connolly, Patrick (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S521000

Reexamination Certificate

active

11112826

ABSTRACT:
A measuring apparatus for measuring optical performance of a test optics by using light includes a first member for generating a first ideal wave front, a second member for generating a second ideal wave front and a test wave front that reflects the optical performance of the test optics, and a detector for detecting an interference fringe between the test wave front and the second ideal wave front that passes the second member, wherein the first member and/or the second member include a first membrane having a first aperture for diffracting the light, and a second membrane having a second aperture for diffracting the light that has passed the first aperture, the second membrane being spaced from the first membrane so that the first and second apertures overlap each other.

REFERENCES:
patent: 5835217 (1998-11-01), Medecki
patent: 7106456 (2006-09-01), Cottrell
patent: 2007/0019175 (2007-01-01), Ohsaki et al.
patent: 2004-055264 (2004-02-01), None
U.S. Appl. No. 11/064,558, filed Feb. 24, 2005, Akinori Okhubo.
“Special Issue: Aiming at ultimate uses of optical technologies, measuring a wave font at ultimate uses” A copy of the reference and a translation of “2.1 PDI” of pp. 44-45 thereof are enclosed herewith as a concise explanation of the relevance. vol. 26, No. 1 O plus E, 2003.
Sekine, Y., et al. Wave front errors of reference spherical waves in high-numerical aperture point diffraction interferometers, J. Vac. Sci Technol. B22 (1) Jan./Feb. 2004.

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