Measurement of thin films by polarized light

Optics: measuring and testing – Refraction testing – Prism engaging specimen

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356119, G01N 2140

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active

039854477

ABSTRACT:
In order to measure the thickness and refractive index of a thin film on a substrate, such as a film of silicon dioxide on a substrate of silicon, a beam of substantially monochromatic polarized light is directed on the film. The reflected light is transmitted through an optical compensator and an optical analyzer both of which are rotating at different angular speeds, .omega..sub.A and .omega..sub.C, respectively; and the transmitted optical intensity is measured as a function of time. A Fourier analysis, for example, of the profile of this optical intensity vs. time can then be used for determining the Stokes parameters of the light reflected by the thin film and thereby also the thickness and refractive index of the film.

REFERENCES:
ord et al. "A Computer-Operated Following Ellipsometer" Applied Optics, 10-67, pp. 1673-1677.
Richartz; M. "Mesmethoden des MacCullaghschen Kompensators" Zeitschrift fur Instrumentenkunde vol. 74, 4-66, pp. 120-125.
Aspnes et al. "High Precision Scanning Ellipsometer" Applied Optics, vol. 14, 1-75, pp. 220-228.
Kent et al. "A Photoelectric Method for the Determination of the Parameters of Elliptically Polarized Light," Jr. Optical Soc. of America vol. 27, 3-1937 pp. 117-119.
Reinberg, A. R. "Ellipsometer Data Analysis with a Small Programmable Desk Calculator", Applied Optics vol. 11, 5-72, pp. 1273-1274.
Born et al. "Principles of Optics," MacMillan Co. 1964 pp. 554-555.

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