Measurement of optical properties of radiation sensitive...

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07099018

ABSTRACT:
A system and method for measuring optical properties of films deposited or formed on semiconductor wafers. Measurements of an optical property are made in a plurality of non-overlapping locations within a test region of a film at a low radiation dose, and the measurements are averaged. The radiation dose is less than the actinic radiation sensitivity dose of the film, so that chemical changes in the film are not caused by the measurements. The measurements may be calibrated to prior art methods, and the results may be adjusted by the adjustment or calibration factor.

REFERENCES:
patent: 4977330 (1990-12-01), Batchelder et al.
patent: 5241366 (1993-08-01), Bevis et al.
patent: 5409538 (1995-04-01), Nakayama et al.
patent: 6567213 (2003-05-01), Rosencwaig et al.
patent: 2002/0090743 (2002-07-01), Johnson et al.
patent: WO 03/025497 (2003-03-01), None
Diamond, William J., “Practical Experiment Designs for Engineers and Scientists,” pp. 25-33, Van Nostrand Reinhold Company, Inc., New York 1981.
Wolf, S. and Tauber, R.N., “Silicon Processing for the VLSI Era,” vol. I: Process Technology, 2nd Ed., pp. 488-491, Lattice Press, Sunset Beach, CA, 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Measurement of optical properties of radiation sensitive... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measurement of optical properties of radiation sensitive..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measurement of optical properties of radiation sensitive... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3707472

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.