Measurement method, measurement apparatus, exposure...

Details Measurement method, measurement apparatus, exposure... Measurement method, measurement apparatus, exposure...

2011-08-09

2011-08-09

Lee, Hwa S. A (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07995213

ABSTRACT:
A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.

REFERENCES:
patent: 2002/0012124 (2002-01-01), Nakayama et al.
patent: 2002/0024673 (2002-02-01), Ouchi

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