Optics: measuring and testing – Lens or reflective image former testing
Reexamination Certificate
2011-05-24
2011-05-24
Pham, Hoa Q (Department: 2886)
Optics: measuring and testing
Lens or reflective image former testing
C430S030000
Reexamination Certificate
active
07948616
ABSTRACT:
An image of an aperture pattern that includes an L/S pattern having a linewidth that exceeds the measurement resolution of a measurement device is generated in each of divided areas on a wafer via an optical system. A part of each of the divided areas on the wafer exposed via a projection optical system, and an image of the aperture pattern after removal of a part of the image of the L/S pattern is formed in each of the divided areas. An image of the pattern that is obtained by removing a part of the pattern is formed in each of the divided areas after the wafer is developed. Measurement is performed by a measurement device using the wafer as a sample, and the optical characteristics of the projection optical system (such as a best focus position, field of curvature, or astigmatism) are obtained.
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Nikon Corporation
Oliff & Berridg,e PLC
Pham Hoa Q
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