Measurement method and apparatus, exposure apparatus, and...

Details Measurement method and apparatus, exposure apparatus, and... Measurement method and apparatus, exposure apparatus, and...

2006-11-27

2008-12-09

Lyons, Michael A (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S521000

Reexamination Certificate

active

07463365

ABSTRACT:
A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an image side of the target optical system, the first image side slit having, in a shorter direction, a width equal to or smaller than a diffraction limit of the target optical system, and the second image side slit having, in a shorter direction, a width greater than the diffraction limit of the target optical system includes the steps of obtaining three or more primary wavefronts of the target optical system from different measurement directions, and calculating a wavefront aberration of the target optical system based on the three or more primary wavefronts obtained by the obtaining step.

REFERENCES:
patent: 5196350 (1993-03-01), Backman et al.
patent: 6690474 (2004-02-01), Shirley
patent: 2005/0046865 (2005-03-01), Brock et al.
patent: 2005/0190378 (2005-09-01), Nakauchi
patent: 2006/0061757 (2006-03-01), Yamamoto et al.
patent: 2004-273748 (2004-09-01), None
patent: 2005-374808 (2005-12-01), None

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