Optics: measuring and testing – By light interference – Having wavefront division
Reexamination Certificate
2006-11-27
2008-09-23
Connolly, Patrick (Department: 2877)
Optics: measuring and testing
By light interference
Having wavefront division
C356S494000, C356S515000
Reexamination Certificate
active
07428059
ABSTRACT:
A measurement method measures a wavefront aberration of a target optical system using an interference pattern formed by lights from first and second image side slits. The first image side slit has a width equal to or smaller than a diffraction limit of the target optical system. The measurement method includes the steps of obtaining a first and second wavefronts having wavefront aberration information of the target optical system in ±45° directions relative to the polarization direction of the light, and calculating wavefront aberration of the target optical system based on the first and second wavefronts of the target optical system obtained by the obtaining step.
REFERENCES:
patent: 5196350 (1993-03-01), Backman et al.
patent: 5237388 (1993-08-01), Hirano et al.
patent: 5341312 (1994-08-01), Lisson et al.
patent: 6233056 (2001-05-01), Naulleau et al.
patent: 6239878 (2001-05-01), Goldberg
patent: 6307635 (2001-10-01), Goldberg
patent: 6456382 (2002-09-01), Ichihara et al.
patent: 6573997 (2003-06-01), Goldberg et al.
patent: 6650399 (2003-11-01), Baselmans et al.
patent: 6690474 (2004-02-01), Shirley
patent: 7230717 (2007-06-01), Brock et al.
patent: 7283252 (2007-10-01), Kato
patent: 7295327 (2007-11-01), Ohkubo
patent: 7301646 (2007-11-01), Wegmann et al.
patent: 7304749 (2007-12-01), Ohkubo
patent: 2002/0191195 (2002-12-01), Ichihara et al.
patent: 2004/0174533 (2004-09-01), Nakauchi
patent: 2005/0046865 (2005-03-01), Brock et al.
patent: 2005/0190378 (2005-09-01), Nakauchi
patent: 2006/0044536 (2006-03-01), Ohsaki
patent: 2006/0044569 (2006-03-01), Kato
patent: 2006/0061757 (2006-03-01), Yamamoto et al.
patent: 2006/0187435 (2006-08-01), Ohsaki
patent: 2006/0262323 (2006-11-01), Yamamoto
patent: 2004-273748 (2004-09-01), None
patent: 2005-375946 (2005-12-01), None
Canon Kabushiki Kaisha
Connolly Patrick
Morgan & Finnegan , LLP
Richey Scott M
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