Measurement method and apparatus, exposure apparatus

Details Measurement method and apparatus, exposure apparatus Measurement method and apparatus, exposure apparatus

2007-04-02

2009-10-27

Lyons, Michael A (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07609390

ABSTRACT:
A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system parameter a shift from a design value of a value that defines a structure of the measurement apparatus and the target optical system, and measuring the wavefront aberration of the target optical system using the system parameter.

REFERENCES:
patent: 6312373 (2001-11-01), Ichihara
patent: 2002/0001088 (2002-01-01), Wegmann et al.
patent: 2003/0091913 (2003-05-01), Shiode
patent: 2004/0032579 (2004-02-01), Emer et al.
patent: 2005/0190378 (2005-09-01), Nakauchi
patent: 2000-097666 (2000-04-01), None
patent: 2005-244126 (2005-09-01), None

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