Measurement apparatus, exposure apparatus having the same,...

Details Measurement apparatus, exposure apparatus having the same,... Measurement apparatus, exposure apparatus having the same,...

2011-05-31

2011-05-31

Nguyen, Hung Henry (Department: 2882)

Optics: measuring and testing

By light interference

Having wavefront division

C355S067000

Reexamination Certificate

active

07952726

ABSTRACT:
A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.

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International Search Report issued on Apr. 24, 2007 for International Application No. PCT/JP2007/054373.

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