Means to orbit and rotate target wafers supported on planet memb

Details Means to orbit and rotate target wafers supported on planet memb Means to orbit and rotate target wafers supported on planet memb

1979-10-31

1981-08-18

Kaplan, Morris

Coating apparatus

Gas or vapor deposition

Work support

269 57, C23C 1308

Patent

active

042840333

ABSTRACT:
A vapor deposition system wherein means orbit a plurality of rotating planets. Each planet supports a plurality of wafer targets which orbit the associated planet axis. A planet wheel of limited rotatability is operative to effect rotation of the orbiting wafer targets.

REFERENCES:
patent: 3598083 (1971-08-01), Dort
patent: 3643625 (1972-02-01), Mahl
patent: 3783821 (1974-01-01), Dobson et al.
patent: 3853091 (1974-12-01), Christensen et al.
patent: 3926421 (1975-12-01), Reiger et al.
patent: 3983838 (1976-10-01), Christensen
patent: 4087239 (1978-05-01), Cline et al.

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