Means and method for inducing uniform parallel alignment of liqu

Details Means and method for inducing uniform parallel alignment of liqu Means and method for inducing uniform parallel alignment of liqu

1975-04-21

1979-05-08

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

156643, 204192E, 350341, C23C 1500, G02F 113

Patent

active

041535294

ABSTRACT:
Electrode surfaces are coated with a passivating material (silicon dioxide, aluminum oxide or titanium dioxide) or with a reflecting material (chromium or chromium and gold) or with a special alignment material (carbon) using standard vacuum sputtering, vacuum evaporation, electrodeposition, or chemical vapor deposition techniques. After sufficient thickness of material has been deposited, the substrate is exposed to a broad or narrow beam of neutralized argon ions of a few kilo-electron-volts energy. The beam of argon ions is incident at a grazing angle to the surface, typically 20.degree.. Exposure of the overcoating results in a microscopic condition believed to comprise a "corrugated" surface with "ridges" and "valleys" parallel to the direction of the incident beam. These microscopically fine grooves or streaks are (1) reproducibly effective in causing parallel alignment of the liquid crystal molecules, (2) are durable to repeated cleaning procedures and air-bake treatments, and (3) are amenable to production applications in conjunction with vacuum deposition equipment.

REFERENCES:
patent: 3834792 (1974-09-01), Janning
patent: 3914020 (1975-10-01), Helfrich
J. L. Janning, "Thin Film Surface Orientation for Liquid Crystals", Applied Physics Letters, vol. 21, No. 4, Aug. 1972, pp. 173-174.
H. L. Garvin, "High Resolution Fabrication by Ion Beam Sputtering", Solid State Technology, vol. 16, No. 11, Nov. 1973, pp. 31-36.

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