MBE method for preparing high Tc superconducting thin films

Details MBE method for preparing high Tc superconducting thin films MBE method for preparing high Tc superconducting thin films

1993-11-16

1995-04-04

King, Roy V.

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

Coating

505729, 505730, 427 62, 4271263, 4274193, 427314, 117108, C23C 1424

Patent

active

054038197

ABSTRACT:
A method for preparing a thin film formed of an oxide superconductor on a substrate by emitting molecular beams of constituent elements of the oxide superconductor to the substrate under high vacuum, wherein at first a molecular beam of one of the constituent elements of the oxide superconductor, of which an oxide thin film can be deposited so as to have a smooth surface, is emitted so as to form the oxide thin film of one or two unit cells. And then, all the molecular beams of constituent elements of the oxide superconductor are emitted to the oxide thin film so as to form the oxide superconductor thin film.

REFERENCES:
patent: 5135906 (1992-08-01), Harada et al.
Wang et al, "High Tc Films by Molecular beam epitaxy", High Tc Superconductor Thin Films, edited by Correra (1992) pp. 549-554.
Schuhl et al, "Atomic layer by atomic layer growth of DyBaCuO superconducting thin films by molecular beam epitaxy", Appl. Phys. lett.578), Aug. 1990, pp. 819-821.
Watanabe et al, "Molecular beam epitaxy study of Bi.sub.2 Sr.sub.2 CuO.sub.x using NO.sub.2 as an oxidizing agent", Jpn. J. Appl. Phys. 29(7) Jul. 1990, pp. L1111-1113.

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