Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Compound semiconductor
Reexamination Certificate
2011-01-11
2011-01-11
Prenty, Mark (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Compound semiconductor
C257SE21097
Reexamination Certificate
active
07867799
ABSTRACT:
A method of fabricating a continuous wave semiconductor laser diode in the (Al,Ga,In)N materials system comprises: growing, in sequence, a first cladding region (4), a first optical guiding region (5), an active region (6), a second optical guiding region (7) and a second cladding region (8). Each of the first cladding region (4), the first optical guiding region (5), the active region (6), the second optical guiding region (7) and the second cladding region (8) is deposited by molecular beam epitaxy.
REFERENCES:
patent: 5513199 (1996-04-01), Haase et al.
patent: 5777350 (1998-07-01), Nakamura et al.
patent: 5786269 (1998-07-01), Murakami et al.
patent: 5972730 (1999-10-01), Saito et al.
patent: 6239033 (2001-05-01), Kawai
patent: 6456640 (2002-09-01), Okumura
patent: 6518082 (2003-02-01), Kidoguchi et al.
patent: 6586819 (2003-07-01), Matsuoka
patent: 6777253 (2004-08-01), Ishibashi et al.
patent: 6891268 (2005-05-01), Tomiya et al.
patent: 6912236 (2005-06-01), Shimizu et al.
patent: 7183569 (2007-02-01), Okumura
patent: 2001/0010941 (2001-08-01), Morita
patent: 2001/0040245 (2001-11-01), Kawai
patent: 2002/0033521 (2002-03-01), Matsuoka
patent: 2005/0095768 (2005-05-01), Tsuda et al.
patent: 2005/0180485 (2005-08-01), Shimizu et al.
patent: 1 182 697 (2002-02-01), None
patent: 09-232680 (1997-09-01), None
patent: 10-154851 (1998-06-01), None
patent: 11-274079 (1999-10-01), None
patent: 2000-072692 (2000-03-01), None
patent: 2002-145700 (2002-05-01), None
Shuji Nakamura et al.; “InGaN-Based Multi-Quantam-Well-Structure Laser Diodes”; Jpn. J. Appl. Phys.; 1996; vol. 35, pp. L74-L76.
M. Johnson et al.; “A Critical Comparison Between MOVPE and MBE Growth of III-V Nitride Semiconductor Materials for Opto-Electronic Device Applications”; Mat. Res. Soc. Proc.; 1999;, vol. 537; p. G5.10.
Chinese Office Action for corresponding Application No. 200410102390.X dated Jul. 28, 2006.
Bousquet Valerie
Heffernan Jonathan
Hooper Stewart
Johnson Katherine L.
Kauer Matthias
Prenty Mark
Renner , Otto, Boisselle & Sklar, LLP
Sharp Kabushiki Kaisha
LandOfFree
MBE growth of a semiconductor laser diode does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with MBE growth of a semiconductor laser diode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MBE growth of a semiconductor laser diode will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2626549