Maxim electron scatter chamber

Details Maxim electron scatter chamber Maxim electron scatter chamber

2011-08-30

2011-08-30

Berman, Jack (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S455110, C426S240000

Reexamination Certificate

active

08008640

ABSTRACT:
The present invention includes a system, methods and apparatus for sterilization of an object (e.g., food products). The present invention takes advantage of the electron scatter that occurs when electron beam is applied onto a surface. The present invention is capable of treating irregular surfaces (e.g., carcasses, spherical/round surfaces) or any type of surface where complete penetration is not needed or desired.

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patent: 6221216 (2001-08-01), Nablo et al.
patent: 7145155 (2006-12-01), Nablo et al.
International Search Report and Written Opinion for PCT/US2009/049408 dated Feb. 11, 2010.
Weiss, D., et al., “Electron beam process validation for sterilization of complex geometries,” Radiation Physics and Chemistry (2002), 63:581-586.

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