Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate
2011-08-16
2011-08-16
Nguyen, Thinh T (Department: 2818)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Optical characteristic sensed
C438S671000, C438S975000, C438S048000
Reexamination Certificate
active
07998759
ABSTRACT:
There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a mask stage of an exposure apparatus, forming a corresponding relation of each mask substrate, the first information and the second information, selecting the second information showing a desired flatness among the second information of the corresponding relation, and preparing another mask substrate having the same surface shape as the surface shape indicated by the first information in the corresponding relation with the selected second information, and forming a desired pattern on the above-mentioned another mask substrate.
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Communication mailed by the Japanese Patent Office on Apr. 10, 2007 for counterpart application No. 2006-294930 and English-language translation (5 pages).
Finnegan Henderson Farabow Garrett & Dunner LLP
Kabushiki Kaisha Toshiba
Nguyen Thinh T
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