Materials processing with a high repetition rate isotopic carbon

Details Materials processing with a high repetition rate isotopic carbon Materials processing with a high repetition rate isotopic carbon

1993-07-12

1994-10-04

Lee, John D.

Coherent light generators

Particular active media

Gas

2191216, 372 60, 372 81, H01S 322

Patent

active

053532961

ABSTRACT:
An laser system is disclosed for materials processing. The system includes an RF excited, conduction cooled, sealed gas laser. The lasing species in the gas mixture is an isotope of carbon dioxide and in the preferred embodiment is defined by the .sup.13 CO.sub.2 isotope. The use of the .sup.13 CO.sub.2 isotope functions to shorten the rise and fall times of the laser pulses. By this arrangement, the laser may be operated at higher repetition rates with a full depth of power modulation.

REFERENCES:
patent: Re30898 (1982-04-01), Cantrell et al.
patent: 4061921 (1977-12-01), Cantrell et al.
patent: 4163199 (1979-07-01), Treanor
patent: 4839330 (1989-06-01), Hess et al.
patent: 5062842 (1991-11-01), Tiffany
patent: 5131003 (1992-07-01), Mefferd
K. M. Jeong, H. P. Chou, G. A. Theophanis & V. H. Hasson, "CO.sub.2 Laser Gain Energy Extraction Using .sup.12 C and .sup.13 C Isotopes," CO.sub.2 Lasers and Applications, 1989, SPIE vol. 1042, pp. 75-78 (No Month).
C. Freed, "Status of CO.sub.2 Isotope Lasers and Their Applications in Tunable Laser Spectroscopy," IEEE Journal of Quantum Electronics, Aug. 1982, vol. QE-18, No. 8, pp. 1220-1228.
L. Ernestine, F. C. Freed & R. G. O'Donnell, "Small Gain and Saturation Intensity of 00.degree. 1-[10.degree.0, 02.degree.0].sub.I and II Vibrational Band Transmitions in Sealed-Off CO.sub.2 Isotope Lasers," IEEE Jurnal of Quantum Electronics, vol. QE-18, No. 8, Aug. 1982, pp. 1229-1236.
D. G35013 F. Kroeker, M. A. DeFaccio, A. L. Pindroh, D. R. Guyer, C. H. Fisher & S. E. Moody, "Small Signal Gain and Vibrational Relaxation for .sup.13 CO .sub.2," Applied Optics,1989(Mar.), 28:897-900.

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