Materials, methods, and uses for photochemical generation of...

Compositions – Radiation sensitive

Reexamination Certificate

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C252S582000, C252S583000, C252S501100, C568S077000

Reexamination Certificate

active

07459106

ABSTRACT:
The present invention provides compounds and compositions, which include: at least one chromophore having strong simultaneous two-photon or multi-photon absorptivity; at least one acid- or radical-generator in close proximity to the chromophore; such that the single- or multi-photon excitation of the chromophore results in the generation of an acid and/or redical that is capable of activating chemistry; and such that compositions of matter based on the componds and compositions of the invention can be photo-patterned by one- or multiphoton excitation.

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Mariacristina Rumi, et al., “Structure-Property Relationships for Two-Photon Absorbing Chromophores: Bis-Donor Diphenylpolyene and Bis(styryl)benzene Derivatives”, J. Am. Chem. Soc, vol. 122, 2000, 9500-9510.

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