Materials and methods for creating imaging layers

Details Materials and methods for creating imaging layers Materials and methods for creating imaging layers

2009-02-17

2010-12-14

Lee, Calvin (Department: 2892)

Semiconductor device manufacturing: process

Having organic semiconductive component

C257S040000, C257S643000

Reexamination Certificate

active

07851252

ABSTRACT:
The present invention provides patterned features of dimensions of less than 50 nm on a substrate. According to various embodiments, the features may be “Manhattan” style structures, have high aspect ratios, and/or have atomically smooth surfaces. The patterned features are made from polymer brushes grafted to a substrate. In some embodiments, the dimensions of the features may be determined by adjusting the grafting density and/or the molecular weight of the brushes. Once the brushes are patterned, the features can be shaped and reshaped with thermal or solvent treatments to achieve the desired profiles. The chemical nature of the polymer brush is thus independent of the patterning process, which allows for optimization of the polymer brush used for specific applications. Applications include masks for pattern transfer techniques such as reactive ion etching.

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