Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2006-04-25
2006-04-25
Huynh, Andy (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S013000, C257S079000, C257S103000, C257S104000, C257S183000, C257S918000, C438S022000, C438S024000, C438S025000, C438S028000, C438S029000, C438S046000, C438S047000
Reexamination Certificate
active
07034331
ABSTRACT:
The tunnel junction structure comprises a p-type tunnel junction layer of a first semiconductor material, an n-type tunnel junction layer of a second semiconductor material and a tunnel junction between the tunnel junction layers. At least one of the semiconductor materials includes gallium (Ga), arsenic (As) and either nitrogen (N) or antimony (Sb). The probability of tunneling is significantly increased, and the voltage drop across the tunnel junction is consequently decreased, by forming the tunnel junction structure of materials having a reduced difference between the valence band energy of the material of the p-type tunnel junction layer and the conduction band energy of the n-type tunnel junction layer.
REFERENCES:
patent: 5679963 (1997-10-01), Klem et al.
patent: 5944913 (1999-08-01), Hou et al.
patent: 6372980 (2002-04-01), Freundlich
patent: 2002/0090016 (2002-07-01), Coldren et al.
Ortsiefer, Markus, “Low Resistance InGa(Al) as Tunnel Junctions for Long Wavelength Vertical-Cavity Surface-Emitting Lasers”, Jpn J. Appl. Phys. Vol. 39 (2000), pp. 1727-1729.
Chang Ying-Lan
Leary Michael H.
Tan Michael R. T.
Tandon Ashish
Agilent Technologie,s Inc.
Hardcastle Ian
Huynh Andy
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