Material independent optical profilometer

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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Reexamination Certificate

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11269336

ABSTRACT:
A material independent optical profilometer system and method for measuring at least one of either a height or a slope of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed.

REFERENCES:
patent: 5986763 (1999-11-01), Inoue
patent: 6353222 (2002-03-01), Dotan
patent: 6542248 (2003-04-01), Schwarz

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