Material for purification of semiconductor polishing slurry,...

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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C210S679000, C210S681000

Reexamination Certificate

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07625262

ABSTRACT:
A material for purification of a semiconductor polishing slurry that without changing of pH value, is capable of efficiently purifying a polishing slurry to thereby not only prevent metal contamination of a polished object as effectively as possible but also achieve recycling of a polishing slurry without any problem; a relevant module for purification of a semiconductor polishing slurry; and a process for purifying a semiconductor polishing slurry with the use thereof. In particular, a material for purification of a semiconductor polishing slurry characterized in that it comprises a fibrous substrate having a functional group capable of forming a metal chelate or such a functional group together with hydroxyl fixed onto at least the surface thereof. This material for purification of a semiconductor polishing slurry is, for example, used in such a manner that it is inserted in a container fitted with polishing slurry inflow port and outflow port while ensuring passage of polishing slurry flow.

REFERENCES:
patent: 4500396 (1985-02-01), D'Agostino et al.
patent: 4514367 (1985-04-01), Asami et al.
patent: 1179627 (2002-02-01), None
patent: 09-314466 (1997-12-01), None
patent: 11-186201 (1999-07-01), None
patent: 2000-248467 (2000-09-01), None
patent: 2004-075859 (2004-03-01), None

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