Material for forming protective film

Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant

Reexamination Certificate

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Details

C252S182130, C252S182230, C252S182240, C252S182260, C252S182280, C252S06230Q, C257S789000, C257S795000, C257SE21579, C438S496000, C438S623000, C438S780000, C438S781000

Reexamination Certificate

active

10147942

ABSTRACT:
A material for forming a protective film comprising an organic solvent and a compound having at least two alicyclic structures.

REFERENCES:
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patent: 6042991 (2000-03-01), Aoai et al.
patent: 6165678 (2000-12-01), Allen et al.
patent: 6258508 (2001-07-01), Kim et al.
patent: 6268106 (2001-07-01), Park et al.
patent: 6410204 (2002-06-01), Kodama et al.
patent: 6497987 (2002-12-01), Kim et al.
patent: 6514664 (2003-02-01), Touky et al.
patent: 6641974 (2003-11-01), Kim et al.
patent: 2002/0182360 (2002-12-01), Koshiyama et al.
patent: 2000-195955 (2000-07-01), None

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