Material for forming exposure light-blocking film,...

Details Material for forming exposure light-blocking film,... Material for forming exposure light-blocking film,...

2010-03-22

2010-11-09

Wilczewski, Mary (Department: 2822)

Active solid-state devices (e.g., transistors, solid-state diode

Combined with electrical contact or lead

Of specified material other than unalloyed aluminum

C438S118000, C438S622000, C524S588000, C525S474000, C525S477000, C528S034000, C528S026000, C528S029000, C528S014000, C528S035000

Reexamination Certificate

active

07830012

ABSTRACT:
To provide a material for forming an exposure light-blocking film which includes at least one of a silicon compound expressed by the following structural formula (1) and a silicon compound expressed by the following structural formula (2), wherein at least one of R1and R2is replaced by a substituent capable of absorbing exposure light.(where R1and R2may be the same or different, and each represents any one of a hydrogen atom, alkyl group, alkenyl group, cycloalkyl group and aryl group which are optionally substituted, and n is an integer of 2 or greater)(where R1, R2and R3may be the same or different, at least one of R1, R2and R3represents a hydrogen atom and the others represent any one of an alkyl group, alkenyl group, cycloalkyl group and aryl group which are optionally substituted, and n is an integer of 2 or greater).

REFERENCES:
patent: 7297360 (2007-11-01), Yoshioka et al.
patent: 2001/0033026 (2001-10-01), Nakata et al.
patent: 2003/0162412 (2003-08-01), Chung
patent: 2004/0110896 (2004-06-01), Yoshioka et al.
patent: 2007/0020834 (2007-01-01), Hirai et al.
patent: 2007/0021580 (2007-01-01), Nakagawa et al.
patent: 2007/0026580 (2007-02-01), Fujii
patent: 1446374 (2003-10-01), None
patent: 69115632 (1996-08-01), None
patent: 10113110 (2001-10-01), None
patent: 102005008857 (2006-09-01), None
patent: 0481434 (1992-04-01), None
patent: 1427004 (2004-06-01), None
patent: 7-202040 (1995-08-01), None
patent: 8-6014 (1996-01-01), None
patent: 8-287715 (1996-11-01), None
patent: 10-256363 (1998-09-01), None
patent: 2004-127606 (2004-04-01), None
patent: 2004-153147 (2004-05-01), None
patent: 2004/040635 (2004-05-01), None
patent: 2006/056285 (2006-06-01), None
Chinese Office Action issued Apr. 17, 2009 in corresponding Chinese Patent Application No. 200610105675.8.
English translation of the German Office Action publication No. 102006029334 dated Dec. 22, 2006.

Affiliated with

Also associated with

Rating

Material for forming exposure light-blocking film,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Material for forming exposure light-blocking film,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Material for forming exposure light-blocking film,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4250732