Material for forming exposure light-blocking film,...

Details Material for forming exposure light-blocking film,... Material for forming exposure light-blocking film,...

2006-06-30

2010-06-01

Smith, Zandra (Department: 2822)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

C525S474000, C525S477000, C528S034000, C528S026000, C528S029000, C528S014000, C528S035000, C438S781000

Reexamination Certificate

active

07728065

ABSTRACT:
To provide a material for forming an exposure light-blocking film which includes at least one of a silicon compound expressed by the following structural formula (1) and a silicon compound expressed by the following structural formula (2), wherein at least one of R1and R2is replaced by a substituent capable of absorbing exposure light.(where R1and R2may be the same or different, and each represents any one of a hydrogen atom, alkyl group, alkenyl group, cycloalkyl group and aryl group which are optionally substituted, and n is an integer of 2 or greater)(where R1, R2and R3may be the same or different, at least one of R1, R2and R3represents a hydrogen atom and the others represent any one of an alkyl group, alkenyl group, cycloalkyl group and aryl group which are optionally substituted, and n is an integer of 2 or greater)

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English translation of the German Office Action publication No. 102006029334 dated Dec. 22, 2006.
Office Action issued Apr. 17, 2009 in corresponding Chinese Patent Application 200610105675.8.

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