Material for forming electroconductive film, method of forming e

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

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4271261, 4273855, 428 1, 556136, 556138, B05D 306, B05D 512

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06106906&

ABSTRACT:
A material for forming an electroconductive film on a substrate comprises a metal and hydrophobic and hydrophilic components. Preferably, the material comprises an organometallic complex expressed by general formula (R.sup.1 COO).sub.n M(NR.sup.2 R.sup.3 R.sup.4).sub.m wherein R.sup.1 represents an alkyl group, each of R.sup.2, R.sup.3 and R.sup.4 represents a hydrogen atom, an alkyl group or an alkenyl group, M represents a metal element and each of n and m represents an integer equal to or greater than 1. The material can be used for forming an electroconductive film of an electron-emitting device or forming a liquid crystal alignment film.

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