Material film for a mask film, process for producing a mask...

Details Material film for a mask film, process for producing a mask... Material film for a mask film, process for producing a mask...

2005-02-01

2008-12-30

McPherson, John A. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S300000, C430S306000, C430S945000

Reexamination Certificate

active

07470490

ABSTRACT:
A material film for a mask film comprising a substrate film transmitting ultraviolet light and a resin layer not transmitting ultraviolet light disposed on one face of the substrate film, the resin layer having a color which can be eliminated by irradiation with laser beams, a transmittance of ultraviolet light of 0.1% or smaller, a thickness of 0.1-30 μm and an average surface roughness on a central line Ra of 0.1-3 μm and comprising carbon black having an average particle diameter of 20-50 nm and a specific surface area of 70-150 m2/g. The resin layer exhibits uniform transparency at portions the color of which is eliminated and suppresses formation of scratches. The mask film is easily positioned in preparation of great printing plates and good contact is easily attained throughout the entire surface suppressing containment of air between the mask film and the printing plate material.

REFERENCES:
patent: 4132168 (1979-01-01), Peterson
patent: 6579660 (2003-06-01), Figov
patent: 2002/0045131 (2002-04-01), Nagase et al.
patent: 2003/0143471 (2003-07-01), Mitsuhashi et al.
patent: 2005/0115920 (2005-06-01), Hiller et al.
patent: 05-24172 (1993-02-01), None
patent: 10-67088 (1998-03-01), None
patent: 2003-215777 (2003-07-01), None

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