Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent
1988-06-28
1990-02-06
Bell, Janyce
Coating processes
Measuring, testing, or indicating
Thickness or uniformity of thickness determined
427 69, 427250, D05D 506
Patent
active
048987468
ABSTRACT:
A system for analyzing an aluminum deposition process to form a coating on a surface of a CRT faceplate panel disposed on an exhaust cart includes: an apparatus within the exhaust cart for controlling the distribution of the aluminum; a sensor disposed on the panel for determining whether aluminum was deposited thereon, and a plurality of thickness monitors disposed on the panel for generating a plurality of signals representative of the relative thickness of the aluminum coating at a plurality of locations on the surface thereof. The signals are converted into data values to indicate whether the aluminum coating achieves a predetermined thickness profile.
A method of depositing the aluminum coating is also disclosed. The method provides an indication of the performance of each of the exhaust carts and permits the categorization of defects for the panels not meeting the predetermined thickness profile.
REFERENCES:
patent: 3067055 (1962-12-01), Saulnier, Jr.
patent: 3582394 (1971-06-01), Salveter, Jr.
patent: 4051270 (1977-09-01), Butler
U.S. Pat. Application, Ser. No. 132,516 filed on 12/14/87 by Stephen Thomas Opresko titled, Apparatus for Controlling the Distribution of Evaporated Material onto a Surface.
Bell Janyce
Coughlin Jr. Vincent J.
Irlbeck Dennis H.
RCA Licensing Corporation
Tripoli Joseph S.
LandOfFree
Material deposition process analysis system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Material deposition process analysis system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Material deposition process analysis system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-441044