Material deposition device

Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to condition of coating material

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Details

118696, 118697, 118698, 118699, 118712, 118620, 118628, 118630, 118631, 118323, 118325, B05B 1206, B05C 500

Patent

active

053243595

ABSTRACT:
A material deposition device places droplets on a substrate. A conveyer on a chassis moves the substrate relative to a plane so a deposition means on the chassis may release material onto the substrate moved by the conveyer. A movable support means attached between the chassis and the deposition means locates it with respect to the conveyer allowing relative motion therebetween. A supply of material connected to the deposition means sends pressurized material thereto. A control causes relative motion between the conveyer and the movable support means varying the position of the deposition means relative to the substrate. The control has a memory operatively connected to timely activate the deposition means. The deposition means has a body communicating with the supply of material and a valve means responsive to the control selectively delivers droplets to the substrate. The body has an inlet communicating with the supply for the valve means and an outlet shaped forms droplets for delivery toward the substrate. An electrostatic means establishes a fixed or varying force field to reposition or recycle the material delivered. An interchangeable outlet orifice adjusts the size of droplets delivered. A vision system examines droplets monitoring quality and a feedback signal to vary the material in each droplet. The radiation station doses droplets.

REFERENCES:
patent: 3991705 (1976-11-01), Adler
patent: 4156398 (1979-05-01), McDaniel
patent: 4421800 (1983-12-01), Schoenberg et al.
patent: 4530862 (1985-07-01), Kerzel
patent: 4716058 (1987-12-01), Morin
patent: 4762578 (1988-08-01), Burgin, Jr. et al.
patent: 4988015 (1991-01-01), Price
patent: 5065695 (1991-11-01), Baron et al.
patent: 5074443 (1991-12-01), Fujii et al.
patent: 5134961 (1992-08-01), Giles et al.
Webster's II New Riverside Dictionary, The Riverside Publishing Company 1984.

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