Matching optical metrology tools using hypothetical profiles

Optics: measuring and testing – Dimension

Reexamination Certificate

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C356S388000

Reexamination Certificate

active

07446887

ABSTRACT:
Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of hypothetical profiles of one or more structures is obtained. The first set of hypothetical profiles was determined based on a first set of measured diffraction signals measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of hypothetical profiles of the structure is obtained. The second set of hypothetical profiles was determined based on a second set of measured diffraction signals measured using a second optical metrology tool from the fleet of optical metrology tools. A reference profile is obtained. A first transform is generated based on the first set of hypothetical profiles and the reference profile. A second transform is generated based on the second set of hypothetical profiles and the reference profile. A first hypothetical profile is obtained, where the first hypothetical profile was determined using the first optical metrology tool. A second hypothetical profile is obtained, where the second hypothetical profile was determined using the second optical metrology tool. The first hypothetical profile is transformed into a first transformed hypothetical profile using the first transform. The second hypothetical profile is transformed into a second transformed hypothetical profile using the second transform.

REFERENCES:
patent: 6317211 (2001-11-01), Ausschnitt et al.
patent: 6660542 (2003-12-01), Stirton
patent: 6785638 (2004-08-01), Niu et al.
patent: 6891626 (2005-05-01), Niu
patent: 6943900 (2005-09-01), Niu et al.
patent: 2003/0076511 (2003-04-01), Aikens et al.
patent: 2004/0267397 (2004-12-01), Doddi et al.
Li, Lifeng, (May 1996) “Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings,”J. Opt. Soc. Am. A, 13(5):1024-1035.
Li, Lifeng (Oct. 1997) “New formulation of the Fourier modal method for crossed surface-relief gratings,”J. Opt. Soc. A. A, 14(10): 2758-2767.
Stanke, Fred et al., pending non-published U.S. Appl. No. 11/438,806, filed May 22, 2006.
Ausschnitt, C.P., (Feb. 23, 2004) “A New Approach to Pattern Metrology,”Proc. SPIE, 5375: 51-65.
Haykin, S., (1999)Neural Networks, Prentice Hall.
Li, L., (1996) “Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings,”J. Opt. Soc. Am, A13:1024-1035.

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