Masks of semiconductor devices and methods of forming mask...

Details Masks of semiconductor devices and methods of forming mask... Masks of semiconductor devices and methods of forming mask...

2004-12-27

2010-02-02

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

07655362

ABSTRACT:
Masks for semiconductor devices and methods of forming masks of semiconductor devices are provided which are capable of improving line resolution. A disclosed mask includes: a first mask pattern disposed on a first side of the mask. The first mask pattern includes light-blocking patterns and light-blocking fine auxiliary patterns within a light-transmitting region. The mask also includes a second mask pattern disposed on a second side of the mask. The second mask pattern includes light-transmitting fine auxiliary patterns within a light-blocking region. The light-transmitting fine auxiliary patterns are disposed at positions corresponding to the light-blocking fine auxiliary patterns to facilitate an overlapping exposing process. The second mask has the opposite tone of the first mask, and the second mask is disposed at a position horizontally-translated from a position of the first mask. Accordingly, pattern bridge regions in repeated patterns of a poly-cell transistor device can be selectively removed.

REFERENCES:
patent: 5439764 (1995-08-01), Alter et al.
patent: 5585210 (1996-12-01), Lee et al.
patent: 5827623 (1998-10-01), Ishida et al.
patent: 6338922 (2002-01-01), Liebmann et al.
patent: 6818480 (2004-11-01), Lee et al.
patent: 2002/0025479 (2002-02-01), Okamoto et al.
patent: 2002/0127479 (2002-09-01), Pierrat
patent: 2004/0053141 (2004-03-01), Pierrat
patent: 2005/0136338 (2005-06-01), Chang

Affiliated with

Also associated with

Rating

Masks of semiconductor devices and methods of forming mask... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Masks of semiconductor devices and methods of forming mask..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Masks of semiconductor devices and methods of forming mask... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4158183