Masks, lithography device and semiconductor component

Details Masks, lithography device and semiconductor component Masks, lithography device and semiconductor component

2011-03-29

2011-03-29

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07914955

ABSTRACT:
One problem of projection optics concerns pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to illuminate the mask inhomogeneously. As a result, inhomogeneities in reflectivity caused by the mask itself are at least partly counteracted. This compensation not only makes the apodization over the pupil become more symmetric but also makes the intensity variation smaller overall.

REFERENCES:
patent: 5458084 (1995-10-01), Thorne et al.
patent: 6243203 (2001-06-01), Schleipen et al.
patent: 6333961 (2001-12-01), Murakami
patent: 7042550 (2006-05-01), Lowisch et al.
patent: 2002/0142230 (2002-10-01), Yan et al.
patent: 2003/0026383 (2003-02-01), Michaelsen et al.
patent: 2003/0222225 (2003-12-01), Shiraishi
patent: 0 600 708 (1994-06-01), None
patent: 1 282 011 (2003-02-01), None
patent: 1 367 605 (2003-12-01), None
patent: 1 367 605 (2003-12-01), None
patent: 04169898 (1992-06-01), None
patent: 2003-014893 (2003-01-01), None
patent: 01/07967 (2001-02-01), None
patent: 01/09681 (2001-02-01), None
patent: 02/00608 (2002-01-01), None
patent: 2005 015314 (2005-02-01), None
M. Singh, et al., Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity, Applied Optics, May 1, 2001, vol. 39, No. 13, pp. 2189-2197, XP 000940136.

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