Masks for applying dots on semiconductor wafers

Details Masks for applying dots on semiconductor wafers Masks for applying dots on semiconductor wafers

1992-12-29

1994-08-16

Pal, Asok

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429812, 430 5, C23C 1500

Patent

active

053384245

ABSTRACT:
A mask and an assembly utilizable in the production of a multiplicity of capacitors on selected regions of a semiconductor wafer includes a shaped, thin sheet of material having spaced-apart holes made therein and at least one recess formed adjacent each of at least two opposite edges thereof, the recess being configured to be engaged by a substantially matching portion of a clamp releasably affixing the mask onto the wafer.

REFERENCES:
patent: 4485000 (1984-11-01), Kawaguchi et al.
patent: 4704306 (1987-11-01), Nakamura
patent: 4830723 (1989-05-01), Galvagni et al.
patent: 4988424 (1991-01-01), Woodward et al.
patent: 5154797 (1992-10-01), Blomquist et al.
patent: 5223108 (1993-06-01), Hurwitt

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