Masks for a double-side exposure machine

Details Masks for a double-side exposure machine Masks for a double-side exposure machine

1994-04-22

1997-02-18

Allen, Stephone

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356400, 355 53, G01V 904

Patent

active

056043546

ABSTRACT:
A pair of masks is designed to expose an upper surface and a lower surface of a silicon wafer. Each mask includes, outside its operative surface area, corresponding to the surface of the silicon wafer, identical or complementary sighting marks.

REFERENCES:
patent: 4764791 (1988-08-01), Omata et al.
patent: 4811062 (1989-03-01), Tabata et al.
patent: 4835078 (1989-05-01), Harvey et al.
patent: 5170058 (1992-12-01), Berasi et al.
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5414514 (1995-05-01), Smith et al.
Solid State Technology, Aug. 1978, USA, 21, 8, 55-60, R. A. Heinz, et al., "Double-Sided Photolithography".

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