Maskless lithography with multiplexed spatial light modulators

Details Maskless lithography with multiplexed spatial light modulators Maskless lithography with multiplexed spatial light modulators

2005-03-22

2005-03-22

Tran, Henry N. (Department: 2674)

Computer graphics processing and selective visual display system

Display driving control circuitry

Intensity or color driving control

C708S816000, C355S067000

Reexamination Certificate

active

06870554

ABSTRACT:
Imaging systems that use a spatial light modulator (SLM), such as maskless lithography systems using a digital micromirror device (DMD), suffer from low throughput at high resolution because of the increase in the number of pixels to be imaged. A possible solution to this problem is provided by using multiple SLMs. However, packaging multiple SLMs on a suitable base is inefficient because, in an SLM, surrounding the active region, a large inactive region is required for the chip kerf and the connector fan-in; these inactive regions thus prevent close packing of the SLMs. This invention enables close packing of a large number of SLMs by arranging them in twin planes, such that the kerf and fan-in regions overlap substantially. Variations in the optical conjugate distances of different SLMs caused by the twin planarity are eliminated by incorporation of a twin-pane compensating mirror array that corresponds to the SLM array, and introduces a pathlength difference between different mirrors that is complementary to the pathlength difference between corresponding SLM chips. Depth-of-focus problems are thus eliminated. The invention enables significant throughput enhancement, up to 82%, in maskless lithography systems.

REFERENCES:
patent: 6238852 (2001-05-01), Klosner
patent: 6247037 (2001-06-01), O'Callaghan

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