Maskless lithography using a multiplexed array of fresnel zone p

Details Maskless lithography using a multiplexed array of fresnel zone p Maskless lithography using a multiplexed array of fresnel zone p

1997-05-30

1999-05-04

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

378 34, H01J 37317

Patent

active

059006374

ABSTRACT:
An array of Fresnel zone plates is illuminated by parallel beamlets of narrow-band electromagnetic radiation. The individual zone plates focus a significant fraction of the incident radiation to foci on a substrate located at least several micrometers distant. The beamlets are capable of being individually turned on or off by shutters, or by deflecting small mirrors that would otherwise direct a beamlet to its Fresnel zone plate. Pattern generation is accomplished by moving the substrate while multiplexing the individual beamlets on or off.

REFERENCES:
patent: 4023904 (1977-05-01), Sheets
patent: 4815854 (1989-03-01), Tanaka et al.
patent: 4947413 (1990-08-01), Jewell et al.
patent: 5424549 (1995-06-01), Feldman
J. Vac. Sci. Technol. B 14(6) Nov./Dec. 1996, pp. 4009-4013, "Analysis of Distortion in Interferometric Lithography", by Ferrera et al.

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