Maskless lithography system and method using optical signals

Details Maskless lithography system and method using optical signals Maskless lithography system and method using optical signals

2005-10-28

2010-06-01

Kim, Peter B (Department: 2882)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492230, C355S053000

Reexamination Certificate

active

07728313

ABSTRACT:
In a lithographic system, data transmission is carried out by a powerful electro-optical free-beam connection system enabling optical pattern data to be guided from light exit places to light entrance places inside the vacuum chamber by free-space optical beams in order to produce control signals. The burden on the pattern production system is significantly reduced by the disappearance of mechanical and electrical contacts. The paths of the free-space optical beams and the particle beams can intersect each other in a non-influential manner. Active photodiodes acting as light exit places can be spatially disposed directly in the pattern production system. Passive light waveguides which can be bundled together to form multipolar fibre array plugs, or active transmission lasers, either of which can also act as light exit places, can be arranged outside the vacuum chamber.

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