Maskless lithography

Details Maskless lithography Maskless lithography

1997-06-18

1999-02-09

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Step and repeat

347239, 359224, 359872, 2504922, G03B 2742

Patent

active

058701761

ABSTRACT:
The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

REFERENCES:
patent: 4954789 (1990-09-01), Sampsell
patent: 5539568 (1996-07-01), Lin et al.
patent: 5631782 (1997-05-01), Smith et al.
patent: 5689428 (1997-11-01), Sauerbrey et al.
patent: 5691541 (1997-11-01), Ceglio et al.

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