Maskless exposure apparatus and method of manufacturing...

Details Maskless exposure apparatus and method of manufacturing... Maskless exposure apparatus and method of manufacturing...

2007-10-05

2011-12-06

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

08072580

ABSTRACT:
The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrate22is disposed on a scan stage20that can be moved in horizontal and vertical directions. Meanwhile, an optical unit30for generating light available for exposure is disposed above the substrate22. Light that has passed though the optical unit30is transferred to a DMD unit40. The DMD unit40is provided with DMDs42for selectively reflecting the light to form a pattern on the substrate22. The DMDs42are arranged in a plurality of rows in such a manner that DMDs42in the same row are spaced apart by a predetermined distance from each other and DMDs42in different rows partially overlap with each other at one end portions thereof. Thus, when the DMDs42scan the substrate22, scan marks62are produced discontinuously in two straight lines. According to the present invention constructed as above, the scan marks are produced discontinuously on the substrate during exposure of the substrate, so that a user cannot recognize the presence of the scan marks when watching a display.

REFERENCES:
patent: 5589869 (1996-12-01), Brandt et al.
patent: 6717650 (2004-04-01), Jain
patent: 7133121 (2006-11-01), Bleeker et al.
patent: 7271877 (2007-09-01), Fries
patent: 7372547 (2008-05-01), Eib et al.
patent: 7618751 (2009-11-01), Sandstrom et al.
patent: 2003-195512 (2003-07-01), None

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