Masking technology for etching contacts

Details Masking technology for etching contacts Masking technology for etching contacts

1996-10-24

1998-10-06

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058174389

ABSTRACT:
A mask structure for etching contacts and its method of use. The mask structure includes: a support glass; a layer of chromium, which blocks the light completely; a layer of partial light shielding material, which determines how much light is to be transmitted by its thickness; a first contact pattern; and a second contact pattern. The first contact pattern allows full light transmission while the second contact pattern allows partial light transmission.

REFERENCES:
patent: 5334467 (1994-08-01), Cronin et al.
patent: 5429897 (1995-07-01), Yoshioka et al.
patent: 5547787 (1996-08-01), Ito et al.
patent: 5620815 (1997-04-01), Ito et al.

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