Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Reexamination Certificate
2005-03-31
2009-06-30
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
C430S005000
Reexamination Certificate
active
07553611
ABSTRACT:
In formation of monolithic three dimensional memory arrays, a photomask may be used more than once. Reuse of a photomask creates second, third or more instances of reference marks used by the stepper to achieve alignment (alignment marks) and to measure alignment achieved (overlay marks) directly above prior instances of the same reference mark. The prior instances of the same reference mark may cause interference with the present instance of the reference mark, complicating alignment and measurement. Using the methods of the present invention, blocking structure is created vertically interposed between subsequent instances of the same reference mark, preventing interference.
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Chen Yung-Tin
Kumar Tanmay
Petti Christopher J
Radigan Steven J
Dugan & Dugan PC
Rosasco Stephen
Sandisk 3D LLC
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