Mask with magnesium diaphragm for X-ray lithography

Details Mask with magnesium diaphragm for X-ray lithography Mask with magnesium diaphragm for X-ray lithography

1986-01-24

1987-10-20

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 35, 430967, G21K 500, G03F 100

Patent

active

047013915

ABSTRACT:
A mask for X-ray lithography is formed of a multilayer diaphragm with a patterned absorber layer on the diaphragm. The diaphragm includes a layer of magnesium and at least one intermediate layer.

REFERENCES:
patent: 3743842 (1973-07-01), Smith et al.
patent: 4454209 (1984-06-01), Blais
patent: 4468799 (1984-08-01), Harms et al.

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