Mask with gradual increase in transmittance from opaque to trans

Details Mask with gradual increase in transmittance from opaque to trans Mask with gradual increase in transmittance from opaque to trans

1996-03-07

1998-03-10

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, G03F 900

Patent

active

057259720

ABSTRACT:
An exposure mask includes a transparent region and an opaque region defined on a transparent substrate, with a transition region formed between he transparent region and the opaque region by a plurality of opaque patterns disposed with respective sizes and respective mutual separations changed gradually and continuously from the opaque region toward the transparent region, such that exposure dose increases gradually and consecutively from the opaque region toward the transparent region.

REFERENCES:
patent: 5487962 (1996-01-01), Rolfson
patent: 5508133 (1996-04-01), Bae
patent: 5523184 (1996-06-01), Hwang et al.
patent: 5585210 (1996-12-01), Lee et al.

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