Mask with extended mask clear-out window and method of dummy...

Details Mask with extended mask clear-out window and method of dummy... Mask with extended mask clear-out window and method of dummy...

2005-11-01

2005-11-01

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06960411

ABSTRACT:
A mask with extended mask window for forming patterns on a semiconductor substrate. The mask includes a main chip array having four sides for forming patterns of a main chip in a semiconductor substrate and a plurality of extended mask windows arranged around the main chip array. A method of dummy exposure using the mask includes providing a semiconductor substrate comprising a nitride layer with a plurality of main chip areas therein, and a plurality of unpatterned areas therein, forming a resist layer on the semiconductor substrate, providing an exposure mask comprising a main chip array and a plurality of extended mask windows, patterning the main chip areas of the semiconductor substrate using the main chip array of the exposure mask, patterning the unpatterned areas of the semiconductor substrate using the windows of the exposure mask, and removing the unexposed portions of the resist layer.

REFERENCES:
patent: 5637424 (1997-06-01), Haruki et al.

Affiliated with

Also associated with

Rating

Mask with extended mask clear-out window and method of dummy... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask with extended mask clear-out window and method of dummy..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask with extended mask clear-out window and method of dummy... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3511227