Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer
Patent
1987-07-31
1989-10-03
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Multilayer
430 17, 430313, 430317, 430325, 156643, G03C 500
Patent
active
048716308
ABSTRACT:
Disclosed is a process for reducing lithographic image size for integrated circuit manufacture. A mask of photosensitive material having an opening of a minimum size dictated by the limits of lithography is formed on a substrate. Reduction in the image size is achieved by establishing sidewalls to the interior vertical surfaces of the opening by depositing a conformal layer, followed by anisotropic etching. The dimension of the opening is reduced by the combined thickness of the two opposite insulator sidewalls.
In a specific direct application of the disclosed process, a photomask/stencil having a pattern of openings of a minimum size smaller than possible by lighography, per se, is formed.
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Giammarco Nicholas J.
Gimpelson Alexander
Kaplita George A.
Lopata Alexander D.
Scaduto Anthony F.
Coca T. Rao
Dees Jos,e G.
International Business Machines - Corporation
Ross, III Otho B.
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