Mask used in charged particle beam projecting apparatus and meth

Details Mask used in charged particle beam projecting apparatus and meth Mask used in charged particle beam projecting apparatus and meth

1997-06-23

1999-04-20

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

058959254

ABSTRACT:
A method for dividing a pattern according to the present invention is used in a charged particle beam projecting apparatus, in which: a plurality of block patterns into which a projected pattern to be projected on a substrate is divided are respectively formed in a plurality of regions of a mask; the plurality of regions of the mask are successively irradiated with a charged particle beam so that the block patterns are successively projected on the substrate; and as a result the projected pattern is formed on the substrate. The method includes a step of dividing the projected pattern into the block patterns by parting lines which are plotted in accordance with profiles of pattern elements that constitute the projected pattern when the block patterns are determined.

REFERENCES:
patent: 4426584 (1984-01-01), Bohlen et al.
patent: 5008830 (1991-04-01), Moriizumi et al.
patent: 5103101 (1992-04-01), Berglund et al.
patent: 5189306 (1993-02-01), Frei
patent: 5260151 (1993-11-01), Berger et al.
patent: 5278419 (1994-01-01), Takahashi et al.
patent: 5371373 (1994-12-01), Shibata et al.
patent: 5424173 (1995-06-01), Wakabayashi et al.
patent: 5432714 (1995-07-01), Chung et al.
patent: 5528048 (1996-06-01), Oae et al.

Affiliated with

Also associated with

Rating

Mask used in charged particle beam projecting apparatus and meth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask used in charged particle beam projecting apparatus and meth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask used in charged particle beam projecting apparatus and meth will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2249231