Mask substrate, projection exposure apparatus equipped with the

Details Mask substrate, projection exposure apparatus equipped with the Mask substrate, projection exposure apparatus equipped with the

1996-10-21

1999-04-13

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430 30, 356399, 356400, 356401, 355 53, 355 67, 355 68, 355 74, G06F 900, G03B 2742, G01B 1100

Patent

active

058940561

ABSTRACT:
In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.

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patent: 5194893 (1993-03-01), Nishi
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patent: 5337097 (1994-08-01), Suzuki et al.
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5464715 (1995-11-01), Nishi et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5477304 (1995-12-01), Nishi

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