Mask substrate and its manufacturing method

Details Mask substrate and its manufacturing method Mask substrate and its manufacturing method

2007-05-01

2007-05-01

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000

Reexamination Certificate

active

10372396

ABSTRACT:
A mask substrate comprises a transparent substrate including a reference mark and a light shielding film formed on the transparent substrate.

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Final Notice of Rejection Issued by Japanese Patent Office mailed Sep. 20, 2005 in Japanese application No. 2002-050123, and English translation of Notice.
Notification of Reasons for Rejection, Japanese Patent Application No. 2002-050123, Feb. 1, 2005.

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