Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-08-15
1997-02-18
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 430394, 430396, G03F 712, G03F 720
Patent
active
056040598
ABSTRACT:
A mask structure has two (or more) groups of device patterns formed on one transparent support plate. Each of the device patterns has a transparent partial pattern. One or both of the groups of device patterns are provided with phase shifting patterns for improvement of the resolution in the lithography. The transparent partial pattern in each of the device patterns in each of the device pattern groups is determined such that each of the transparent partial patterns held by one of the device pattern groups is adapted for combination with one transparent partial pattern held by the other device pattern group by two or more times of transmission of an exposure beam through the mask structure. Manufacturing of solid-state devices is possible by use of the mask structure, in which exposure of a photo-sensitive film on a substrate to an exposure beam through the mask structure is repeated two or more times with a relative position between the mask structure and the substrate being changed.
REFERENCES:
patent: 5132195 (1992-07-01), Pool
patent: 5286584 (1994-02-01), Gemmink
patent: 5330878 (1994-07-01), Nelson
Asai Kengo
Hikita Mitsutaka
Hoshina Yoshinori
Imura Ryo
Isobe Atsushi
Duda Kathleen
Hitachi , Ltd.
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