Mask structure for lithography, method for preparation thereof a

Details Mask structure for lithography, method for preparation thereof a Mask structure for lithography, method for preparation thereof a

1985-11-01

1987-06-30

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430967, 428698, 428446, 4284735, 428480, 428500, 378 34, 378 35, G03F 900

Patent

active

046770429

ABSTRACT:
A mask structure for lithography has a ring frame holding the peripheral portion of a thin film for holding a mask material, the mask material holding thin film comprising a layer of aluminum nitride.

REFERENCES:
patent: 4293624 (1981-10-01), Buckley
patent: 4497878 (1985-02-01), Hatano et al.

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